IBM and SCREEN partner on advanced EUV lithography cleaning process development

Arvind Krishna, Chairman and CEO at IBM
Arvind Krishna, Chairman and CEO at IBM - IBM
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SCREEN Semiconductor Solutions and IBM have announced a new agreement to jointly develop cleaning processes for next-generation Extreme Ultraviolet (EUV) lithography. This collaboration builds on their previous work, which contributed to the development of current nanosheet device technology.

The semiconductor industry is seeing increased adoption of EUV lithography as manufacturers seek to create smaller and more advanced chips. High Numerical Aperture (High NA) EUV, an emerging exposure technology, is considered essential for manufacturing beyond the 2-nanometer node. As chip features shrink, even very small particles or scratches on wafers can affect patterning performance, making precise cleaning processes increasingly important.

Under the new agreement, IBM will contribute its expertise in semiconductor process integration while SCREEN provides advanced wafer cleaning tools. The goal is to address the specific challenges of High NA EUV lithography.

“High NA EUV technology is critical as we look to develop smaller, more powerful semiconductors for the age of AI,” said Mukesh Khare, GM of IBM Semiconductors and VP of Hybrid Cloud at IBM. “We are thrilled to expand our collaboration with SCREEN to ensure that IBM and our ecosystem partners can benefit from this technology innovation.”

Akihiko Okamoto, Representative Director and President of SCREEN Semiconductor Solutions, added: “SCREEN is excited to deepen our collaboration with IBM to develop cleaning technologies that meet the stringent demands of High NA EUV lithography. By combining SCREEN precision cleaning expertise with IBM’s full stack development flow, we aim to deliver robust solutions that enable our customers to realize the potential of sub-2nm manufacturing.”

Both companies intend for this partnership to accelerate advancements in cleaning technologies needed for future semiconductor manufacturing using High NA EUV lithography.

SCREEN Semiconductor Solutions specializes in wafer processing equipment and holds a leading position in global market share for wafer cleaning systems according to its own research. The company offers a range of products supporting various segments within semiconductor production.

IBM continues its involvement in advancing semiconductor process technologies through collaborations such as this one with SCREEN.



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